Magnetic Filters for Plasma Processing: A Proposed Phenomenological Framework for Retention and Stochastic Defect Scaling

This paper proposes a phenomenological framework for examining transverse magnetic filters (TMFs) in plasma processing. Building on the single-layer scaling discussed in Part I, it separates an assumed one-layer retention factor from the physical plasma Debye length and states the assumptions connecting a defect-event rate to accumulated roughness. A deliberately chosen layer thickness of 10 nm and effective attenuation length of 20 nm illustrate partial attenuation through a single layer; their physical realism is not established. The defect-rate closure remains symbolic. The mechanical discussion identifies the missing transfer from plasma force to solid loading, and the causal graphs describe hypotheses that would require identifiable interventions and suitable data. The framework has not been evaluated here by a completed PIC–MCC study, coupled-mechanics calculation or causal-controller test. An intended, uncompleted computational protocol is described separately. The contribution is a set of explicit modelling assumptions and limits, rather than a quantitative demonstration of manufacturing performance.